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eb nano lithography system

Product Details

This system is has  0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method
   (Patent registered)

This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method

Sungmoon Semitech Corp.

  • Country:South Korea
  • telephone:82-317075980
This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method

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