Amorphous Carbon Film

Our Tetrahedral Amorphous Carbon Film Source (ta-C Film Source) uses patented Filtered Cathodic Vacuum Arc (FCVA) technology to provide ultra-thin film deposition. The FCVA source can produce high quality ta-C film which conform to stringent requirements, and are suitable for many industrial applications.These thin films are produced with unsurpassed uniformity and excellent repeatability.The FCVA source can be readily clustered with other system platforms without affecting the overall performance. Application: