ma-1200 exposure system
Product Details
Optimum soft contact & proximity Manual exposure system for multi-items, small production, experiment and research Passive exposure system - Full scale-uniform lighting by unique mirror and lens
optical system - Multi-layer exposure by unique gap device and manual alignment system MA-1200 EXPOSURE Substrate Size Max 200 X 200 X t0.3~2.8mm Alignment Substrate pre-alignment : Pin alignment
Manual alignment type Auto alignment type GAP 30 to 150 ? Resolution L&S 10?
exposure system
