Spin scrubbers equipped with horizontally-rotating brush mechanisms are now widely used in semiconductor manufacturing processes because of their superior cleaning effects. Meanwhile, as
wafer cleaning processes continue to proliferate and their performance criteria become more exacting, there is also growing demand for spin scrubbers which can both boost productivity and
vary cleaning parameters according to wafer surface conditions. In response to such needs, Dainippon Screen has pushed beyond conventional technology to develop the SS-80BW-AR, a high
performance spin scrubber featuring superior throughput.
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