Sputtering target bonding is a process that involves attaching a sputtering target to a backing plate or a substrate holder. The bonding process is crucial in ensuring smooth and efficient sputtering operations. The target material is typically bonded to a metallic or ceramic ...
Metal sputtering targets are critical components of the sputtering process used in the manufacturing of thin films for semiconductor and other advanced applications. These targets are high-purity metals or alloys with specific chemical compositions, and they are subjected to ...
ITO target is made up of a combination of indium oxide and tin oxide and serves as a crucial component in the production of ITO film. This film holds a significant position in the electronic information area and is used in a range of applications such as liquid crystal ...
A kind of filamentous tantalum material made from tantalum powder by rolling, drawing and other plastic processing methods. Specification of Tantalum Wire Application of Tantalum Wire Tantalum wire is the most used in the electronics industry and is mainly used for the anode ...
Seamless tubes are made by extruding, reducing the size of the tubes, or deep drawing with sheet metal. The manufacturing method of welding is first formed strip, and then made into a tube, and then the joint with gas tungsten arc (GTAW) welding. Specification of Tantalum Tube ...
Tantalum sheet metal is tantalum tungsten alloy plate, tantalum plate bright, no cracks, no peeling, no folding, no obvious oxidation, impurities pressed into defects. Contact us and get the tantalum plate price today! Specification of Tantalum Sheet Application of Tantalum ...
Tantalum rod has two kinds of purity, 99.95% and 99.99%. The material is tantalum tungsten alloy rod, the brand is Ta1, Ta2. Specification of Tantalum Rod Application of Tantalum Rod Mainly used in corrosion resistance and superconducting industries, can be used as tantalum ...
Tantalum in powder form, dark gray or silver gray, is an important raw material for the preparation of capacitors and tantalum materials. Classification Tantalum powder is usually divided into two categories according to its use: capacitor grade and metallurgical grade. ...
The requirements for molybdenum targets are significantly more stringent than those of conventional material industries. These requirements entail aspects including size, flatness, purity, content of impurities, density, N/O/C/S levels, grain size, and defect control. Even more ...
Based on high-purity titanium crystal raw materials, Cheeven can produce more than 99.99% high-purity titanium targets. The titanium sputtering target has a uniform structure and a small average grain size and is widely used in semiconductor integrated circuits, optical discs, ...