We can make design the dimension of the vacuum chamber according to your requirement. We can also design and configure the vacuum unit and electric controlling system according to your requirement.
We can design the dimension of the equipment according to customers special technique requirement.
Remark
Manual/Automatic/PC/PLC + HMI/PC four choice of control mode
Control mode
Number display composite vacuum gauge: from atmosphere to 1.0*10-5Pa
Measure mode
Public rotation Frequency control: 0-20 rotation per minute
Workpiece motion mode
Normal temperature to 350 centi-degree PID control, radiation heating.
Workpiece baking temperature
Diffusion pump +Roots pump +Mechanical pump(5.0*10-4Pa)
Molecule pump +Roots pump +Mechanical pump(5.0*10-5Pa)
Vacuum system
Vertical single(side) door, pump system postposition, double water-cooling
Vacuum chamber structure
Quality flowmeter + electromagnetism ceramic valve
Process gas control
Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.
Power source
Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets
Eight multi-arc targets + a pair of twin (MF)magnetron sputtering targets
Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets
Coating mode and main confirguration
1250*1100mm
1000*1000mm
800*1000mm
JTZ-1250
JTZ-1000
JTZ-800
Dimension
Mode Technical parameter: Applied industry: The equipment is widely used in IPG clocks, IPS watches and clocks, guns IP, mobile phone shell, hardware, sanitary ware, cutters, anti-friction tools, dies and mould, etc. It can coat TiN, TiCN, CrN, TiALN, TiNbu, TiCrN, ZrN, and various kinds of diamonds film (DLC). 2.The performance of electric arc plasma evaporation source is reliable, be able to work under the current 30A when optimize the cathode and magnetic field structure coating, and the coating film and substrate interface produce atomic diffusion, plus the feature of the ion beam assisted deposition. Characteristic: 1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness. integrated three technology of DC magnetron sputtering, middle frequency sputtering and electric arc ion evaporation, combining the linear ionize source and pulse bias coating to thin the deposition particles. The various film performance are improved, and be able to coat alloy film, compound film, multilayer composite film on the surface of metal as well as nonmetal. After years of dedicated R&D by our engineer, through unique cathode electric arc ion and unbalanced magnetron systems, we develop a package of PROPOWER series of computer automatic control system. It makes the coating film adhesion density as well as good complex consistency, and solve the problems of the complexity of the manual operation, film color inconsistencies, etc. jewelry metallization vacuum coating machine(JTL-) jewelry metallization vacuum coating machine(JTL-) : |
jewelry metallization vacuum coating machine(JTL-)
coating decorative film to beatify the workpieces
prolong the service life
Delivery Time: | 50 days after received the deposite |
Package: | 20 GP wooden container |
Supply Ability: | 10 Set/Sets per Month |
Minimum Order Quantity: | 1 Set/Sets |
Payment Terms: | L/C,T/T |
Port: | shenzhen |
dimension of chamber 3: | 1000*1100mm |
dimension of chamber 2: | 1000*1000mm |
dimension of chamber 1: | 800*1000mm |
brand name: | HUICHENG |
Type: | Vacuum Furnace |
Model Number: | JTL- |
Brand Name: | HUICHENG |
Place of Origin: | Guangdong China (Mainland) |
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